Excellent in brightness, leveling, film properties High quality films come available Realize high leveling performance with high sulfuric-acid concentration bath Can use for high sulfuric-acid concentration bath High macrothrowing power can be realized
Can co-deposit insoluble ultra-fine patrticles Can obtain beautiful appearances regardless of co-deposition rate Prevent cloudy appearances, high corrosion resistance Can deposit at low-current density, dent areas uniformly Prevent blushing and burnt deposition in Cr plating steps Not damaging to black-color trivalent Cr plating color tones
Nickel Plating Additive For Micro-porous Chromium Plating
Can obtain flexible films at wide current density areas Can obtain uniform appearances, prevent defects about appearances Can use platinum auxiliary anodes Excellent in electric potential stability and corrosion resistance Coumarin-free, formaldehyde-free
Excellent in brightness, leveling, film properties High quality films come available Realize high leveling performance with high sulfuric-acid concentration bath Can use for high sulfuric-acid concentration bath High macro-throwing power can be realized
Can reduce pits High quality films can be easily obtained High-grade physical properties including malleability Less sludge, easy bath maintenance Excellent leveling ability comes available at wide range of current density
ECan reduce pits High quality films can be easily obtained High-grade physical properties including malleability Less sludge, easy bath maintenance Excellent leveling ability comes available at wide range of current density
Uniform semi-bright plating films with high corrosion resistance come available Reduce the impact on appearances by copper impurity accumulation Not containing coumarin, formalin
Uniform semi-bright tone, high leveling and covering power High-grade films can be obtained Reduce the impacts by additives from acid copper plating bathes Not containing coumarin, formalin
Excellent in covering performance at low currect density areas High brightness and leveling performance can be obtained Excellent in covering performance in chromium plating step
Powders can be co-deposited uniformly in low current density, bottom areas of substrates Can reduce the consumption amount of powders Realize beautiful appearances and high corrosion resistance together
Nickel Plating Additive For Micro-porous Chromium Plating
